At the recently held, the AAAI Conference on Artificial Intelligence (AI), Appier demonstrated pioneering research that showcased AI’s ability enabling creativity. AI’s ability to create and design items that humans will find appealing is considered the next important breakthrough especially in the field of apparel industry.
For the research, Appier was represented by Yong-Siang Shih, Dr. Kai-Yueh Chang and Dr. Hsuan-Tien Lin. The Appier team was supported by Prof. Min Sun from National Tsing Hua University. They designed an AI model that first mimics the human ability to put together and design outfits, after observing and learning from examples of good design.
The research suggests that the day when AI can help designers in their day-to-day work might be closer than we thought. Apparel industry is going to benefit with deep learning techniques in combination with a new Projected Compatibility Distance (PCD) methodology. Their design discerns the distance between compatible items.
This compatibility distance is then used to run through a unique application of Generative Adversarial Networks (GANs) to generate novel compatible apparel items when apparel images are input. The output results capture the designers’ concept of how different apparel items combine with one another and is then used to create new apparel designs.
“This is an exciting step forward towards realizing creativity in AI. Appier’s vision has always been for AI to help humans in all aspects of life, and this includes creativity. We don’t however, see AI replacing human creativity, just amplifying it,” said Chih-Han Yu, co-founder and CEO, Appier.
“We also wanted to show the potential for creativity in AI using our unique applications of deep learning techniques in compatibility distance and GAN. The designs generated by our model easily passed the human test which has given us tremendous encouragement,” Dr. Hsuan-Tien Lin, Chief Data Scientist, Appier.